Magnetron sputter PVD systemCemeCon
CC 800/9 HIPIMS
Magnetron sputter PVD system
CemeCon
CC 800/9 HIPIMS
Year of construction
2006
Condition
Used
(fully functional)
Location
Bremen 

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Machine data
- Machine type:
- Magnetron sputter PVD system
- Manufacturer:
- CemeCon
- Model:
- CC 800/9 HIPIMS
- Machine number:
- 11176
- Year of construction:
- 2006
- Condition:
- used
- Functionality:
- fully functional
Price & Location
- Location:
- Bremen, Germany

Details about the offer
- Listing ID:
- A20922332
- Reference number:
- HIPIMS
- Update:
- 13.01.2026
Description
We are offering this used CemeCon CC 800/9 HIPIMS Magnetron Sputtering PVD System, year of manufacture 2006.
Bsdpfx Aox Tt T Rea Djdb
Manufacturer: CemeCon
Model: CC 800/9
Serial number: 11176
Year of manufacture: 2006, upgraded in 2013 and 2025
Weight: 3,000 kg
Protection rating: IP 20
Power rating: 166 kVA
Evaporators: 6
Voltage: 3x400/N/PE V
Frequency: 50/60 Hz
Cemecon CC800/9 HIPIMS
- 6 cathodes
- All cathodes DC, 2 also HIPIMS capable
- Booster anodes
- 4 gases, 1 of which is flammable
- BIAS: DC, MF-pulsed, or HIPIMS
- 3x heating
- 2 turbo pumps
- 6-position substrate holder
- Multiple targets
- Includes option for BNC terminal for Peak I, U, and P at HIPIMS cathodes + BIAS
- Extensive accessories such as loading material, spare parts, consumables
- In 07/2023, the system control was upgraded to the latest standards and a manufacturer service was performed.
A bundle option is also available including a chiller, a precision substrate cleaning system, and a lapping/polishing machine.
If you have any questions or require further information, please feel free to send us a message or call us.
The listing was translated automatically. Translation errors are possible.
Bsdpfx Aox Tt T Rea Djdb
Manufacturer: CemeCon
Model: CC 800/9
Serial number: 11176
Year of manufacture: 2006, upgraded in 2013 and 2025
Weight: 3,000 kg
Protection rating: IP 20
Power rating: 166 kVA
Evaporators: 6
Voltage: 3x400/N/PE V
Frequency: 50/60 Hz
Cemecon CC800/9 HIPIMS
- 6 cathodes
- All cathodes DC, 2 also HIPIMS capable
- Booster anodes
- 4 gases, 1 of which is flammable
- BIAS: DC, MF-pulsed, or HIPIMS
- 3x heating
- 2 turbo pumps
- 6-position substrate holder
- Multiple targets
- Includes option for BNC terminal for Peak I, U, and P at HIPIMS cathodes + BIAS
- Extensive accessories such as loading material, spare parts, consumables
- In 07/2023, the system control was upgraded to the latest standards and a manufacturer service was performed.
A bundle option is also available including a chiller, a precision substrate cleaning system, and a lapping/polishing machine.
If you have any questions or require further information, please feel free to send us a message or call us.
The listing was translated automatically. Translation errors are possible.
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